JPH0525167B2 - - Google Patents
Info
- Publication number
- JPH0525167B2 JPH0525167B2 JP3398384A JP3398384A JPH0525167B2 JP H0525167 B2 JPH0525167 B2 JP H0525167B2 JP 3398384 A JP3398384 A JP 3398384A JP 3398384 A JP3398384 A JP 3398384A JP H0525167 B2 JPH0525167 B2 JP H0525167B2
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- mark
- wafer
- pattern
- alignment mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 description 34
- 238000003384 imaging method Methods 0.000 description 27
- 230000000875 corresponding effect Effects 0.000 description 17
- 238000010586 diagram Methods 0.000 description 15
- 238000005286 illumination Methods 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 108091022873 acetoacetate decarboxylase Proteins 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 101000797092 Mesorhizobium japonicum (strain LMG 29417 / CECT 9101 / MAFF 303099) Probable acetoacetate decarboxylase 3 Proteins 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7092—Signal processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59033983A JPS60178628A (ja) | 1984-02-24 | 1984-02-24 | 露光用マスク |
| US06/703,941 US4679942A (en) | 1984-02-24 | 1985-02-21 | Method of aligning a semiconductor substrate and a photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59033983A JPS60178628A (ja) | 1984-02-24 | 1984-02-24 | 露光用マスク |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3026031A Division JPH0648676B2 (ja) | 1991-02-20 | 1991-02-20 | アライメント装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60178628A JPS60178628A (ja) | 1985-09-12 |
| JPH0525167B2 true JPH0525167B2 (en]) | 1993-04-12 |
Family
ID=12401714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59033983A Granted JPS60178628A (ja) | 1984-02-24 | 1984-02-24 | 露光用マスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60178628A (en]) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0787175B2 (ja) * | 1986-09-19 | 1995-09-20 | キヤノン株式会社 | 露光方法 |
| JPH0746680B2 (ja) * | 1986-09-24 | 1995-05-17 | キヤノン株式会社 | 露光装置 |
| DE3735154C2 (de) * | 1986-10-17 | 1994-10-20 | Canon Kk | Verfahren zum Erfassen der Lage einer auf einem Objekt vorgesehenen Marke |
| JPS63255916A (ja) * | 1987-04-13 | 1988-10-24 | Nikon Corp | 投影光学装置 |
| JPH04153650A (ja) * | 1990-10-17 | 1992-05-27 | Fujitsu Ltd | マスクパターンデータの処理方法 |
-
1984
- 1984-02-24 JP JP59033983A patent/JPS60178628A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60178628A (ja) | 1985-09-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |